Positive photoresists containing novel photoactive compounds
US5876897A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 7, 1997 |
| Grant date | Mar 2, 1999 |
| Priority date | — |
| Expiry date | Mar 7, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A light sensitive positive composition comprising an alkali soluble resin, a novel photoactive compound represented by the structure ##STR1## where, X is O, S or N--R', where R' is H, alkyl, substituted alkyl, aryl or aralkyl, PA1 Y is a connecting group such as SO.sub.2, CO, O or NR', PA1 Z is a carbon containing organic ballast moiety having a molecular weight greater than about 75 and can form a bond with the connecting group, PA1 R is independently H, alkyl, alkoxy, aryl, aralkyl, halo or fluoroalkyl, PA1 m=1-3, and n.gtoreq.1; and a solvent or mixture of solvents. The invention further comprises a process for imaging the composition of this invention to give positive image. The light sensitive composition is especially useful as a positive deep-uv photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.