Photoresist compositions
US5876899A · kind A · utility
12Cited by
8References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 18, 1996 |
| Grant date | Mar 2, 1999 |
| Priority date | — |
| Expiry date | Sep 18, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/117
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for making an acrylic resin photoresist characterized by polymerization of an acrylic monomer in a solvent that dissolves all monomers and resultant polymers. The use of the solvent permits formation of acrylic resins suitable for use in the preparation of photoresists without recovery from its reaction mixture. Photoresists prepared from such polymers have improved transparency, especially at exposures of 193 mn or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.