Sulfonium salts and chemically amplified positive resist compositions
US5880169A · kind A · utility
28Cited by
11References
16Claims
0Family size
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Key dates
| Filing date | Nov 1, 1996 |
| Grant date | Mar 9, 1999 |
| Priority date | — |
| Expiry date | Nov 1, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides a novel sulfonium salt having at least one acid labile group attached to a phenyl group in a molecule and a normal, branched or cyclic C.sub.1 -C.sub.20 alkylsulfonate anion. The novel sulfonium salt is effective for increasing the dissolution contrast between exposed and unexposed areas. Upon exposure, it generates an alkylsulfonic acid which is a weak acid, minimizing the influence of side reaction and deactivation during PEB step. The sulfonium salt is useful in a chemically amplified positive resist composition which lends itself to fine patterning and features high resolution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.