Method of cleaning a substrate by scrubbing
US5882426A · kind A · utility
4Cited by
11References
5Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Feb 10, 1997 |
| Grant date | Mar 16, 1999 |
| Priority date | — |
| Expiry date | Feb 10, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67028
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention provides a cleaning method in which an object to be cleaned is held such that a surface of the object to be cleaned faces a cleaning body and the object to be cleaned and the cleaning body are moved relative to each other in a state where the cleaning body is in contact with the surface to the object to be cleaned, thereby cleaning the surface of the object to be cleaned, wherein a contact pressure of the cleaning body to the surface of the object to be cleaned is set at most 20 gf/cm.sup.2, when the surface is cleaned.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.