Anti-reflection film and optical system using the same
US5885712A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 21, 1997 |
| Grant date | Mar 23, 1999 |
| Priority date | — |
| Expiry date | Mar 21, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C17/3452
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An anti-reflection film is arranged by alternately stacking a plurality of high-refractive index layers containing Al.sub.2 O.sub.3 and a plurality of low-refractive index layers containing SiO.sub.2 on a transparent substrate in turn from the substrate side to the air side, and satisfies: PA1 1.45.ltoreq.ns.ltoreq.1.65 PA1 1.60.ltoreq.na.ltoreq.1.85 PA1 0.31.lambda.0.ltoreq.d1.ltoreq.0.42.lambda.0 PA1 0.38.lambda.0.ltoreq.d2.ltoreq.0.45.lambda.0 PA1 0.20.lambda.0.ltoreq.d3.ltoreq.0.31.lambda.0 PA1 0.18.lambda.0.ltoreq.d4.ltoreq.0.28.lambda.0 PA1 0.20.lambda.0.ltoreq.d5.ltoreq.0.30.lambda.0 PA1 0.20.lambda.0.ltoreq.d6.ltoreq.0.30.lambda.0 where ns and na are the refractive indices of the low-refractive index layer and the high-refractive index layer for light components falling with the wavelength range from 190 nm to 250 nm, di (unit: nm) is the optical film thickness of the i-th layer when the high- and low-refractive index layers are counted from the substrate side to the air side, and .lambda.0 (nm) is the reference wavelength within the wavelength range from 190 nm to 250 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.