Process for removing residue from screening masks with alkaline solution

US5888308A · kind A · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Krishna G. Sachdev · Wappingers Falls, US
• John U. Knickerbocker · Wappingers Falls, US
• Glenn A. Pomerantz · Kerhonkson, US
• Bruce E. Tripp · Rhinebeck, US

Key dates

• Filing date: Feb 28, 1997
• Grant date: Mar 30, 1999
• Expiry date: Feb 28, 2017

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05K3/26
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

This invention relates to the use of water-based cleaning solutions and their use as environmentally safe replacements of chlorinated hydrocarbon solvents to remove metal-polymer composite paste residue from screening masks and ancillary equipment, such as, used for screening a conductive metal pattern on a ceramic green sheet in the manufacture of multi-layer ceramic products.