Method of and apparatus for electronically controlling r.f. energy supplied to a vacuum plasma processor and memory for same
US5892198A · kind A · utility
73Cited by
6References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 29, 1996 |
| Grant date | Apr 6, 1999 |
| Priority date | — |
| Expiry date | Mar 29, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A load including a plasma discharge in a plasma processing chamber is matched to a variable frequency source so the power reflected from the load is substantially minimized. The source voltage or a variable reactance of a matching network between the source and load is controlled so the load has a preset power level, as detected by the difference between the source output power and the power reflected from the load.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.