Exposure apparatus
US5907392A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 18, 1996 |
| Grant date | May 25, 1999 |
| Priority date | — |
| Expiry date | Jul 18, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70775
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A scanning type exposure apparatus includes a mask stage position-measuring unite a substrate stage position-measuring unit, an arithmetic processing unit, and a control unit. The arithmetic processing unit multiplies results of measurement (WX, WY, W.theta.) by the substrate position-measuring unit by a conversion vector including components containing a magnification of a projection optical system and an angle of rotation between a mask and a substrate to determine a target vector quantity (RX*, RY*, R.theta.*) of a mask stage. An error vector is determined by subtracting, from the target vector quantity, results of measurement (RX, RY, R.theta.) by the mask stage position-measuring unit. The controller controls the mask stage so that the error vector becomes zero. The exposure apparatus includes correcting sections for correcting time lags in measurement by the respective position-measuring units. The arithmetic processing unit uses corrected positional information. The mask stage can accurately follow a substrate stage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.