Photoresist developable in aqueous base made from acid-functional .beta.-hydroxy thiol resin
US5925719A · kind A · utility
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Key dates
| Filing date | Jun 19, 1997 |
| Grant date | Jul 20, 1999 |
| Priority date | — |
| Expiry date | Jun 19, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substantially ester-free, acid-functional thiol-functional resin is prepared via the reaction of an epoxy compound with a thiolacetic acid in the presence of an amine catalyst and heat to form a thioacetate derivative which is hydrolyzed to yield an ester-free, .beta.-hydroxy thiol-functional resin. The .beta.-hydroxy thiol-functional resin can then be reacted with a material capable of insert a group conferring aqueous-base developability such as a cyclic anhydride.
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