Patent · US Expired

Repairing fractured wafers in semiconductor manufacturing

US5932379A · kind A · utility

10Cited by
0References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 24, 1998
Grant dateAug 3, 1999
Priority date
Expiry dateFeb 24, 2018

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S430/167
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The specification describes a technique for repairing wafer fractures that occur during wafer fabrication. The fractured pieces are joined edge-to-edge at the fracture line and bonded with epoxy adhesive. The method succeeds because the dimensions of the fracture line after bonding is within the reregistration tolerance of commercial step-and-repeat cameras and the reregistration capability of the camera allows normal exposure of sites that do not intersect the fracture line.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.