Resist for alkali development
US5932391A · kind A · utility
17Cited by
11References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 16, 1996 |
| Grant date | Aug 3, 1999 |
| Priority date | — |
| Expiry date | Aug 16, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist for alkali development, which comprises an alicyclic compound attached with an acidic substituent group exhibiting pKa of 7 to 11 in an aqueous solution of 25.degree. C. This alicyclic compound is preferably a copolymer comprising as a comonomer component a vinyl compound and exhibiting a light absorbency of 3 or less per 1 .mu.m to the light of 193 nm in wavelength.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.