Takeshi Okino
33Patents
10h-index
41Co-inventors
75Inventor score
Filing activity: Apr 26, 1996 → Sep 2, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6303266A | Resin useful for resist, resist composition and pattern forming process using the same | Emerging Cross-Sectional Technologies | 83 | Expired |
| US5962581A | Silicone polymer composition, method of forming a pattern and method of forming an insulating film | Emerging Cross-Sectional Technologies | 48 | Expired |
| US6280897A | Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts | Emerging Cross-Sectional Technologies | 39 | Expired |
| US5837419A | Photosensitive composition | Emerging Cross-Sectional Technologies | 25 | Expired |
| US6440636B1 | Polymeric compound and resin composition for photoresist | Chemistry; Metallurgy | 23 | Expired |
| US6824957B2 | Resin useful for resist, resist composition and pattern forming process using the same | Emerging Cross-Sectional Technologies | 21 | Expired |
| US6071670A | Transparent resin, photosensitive composition, and method of forming a pattern | Emerging Cross-Sectional Technologies | 18 | Expired |
| US5932391A | Resist for alkali development | Emerging Cross-Sectional Technologies | 17 | Expired |
| US6228552A | Photo-sensitive material, method of forming a resist pattern and manufacturing an electronic parts using photo-sensitive material | Physics | 16 | Expired |
| US6045968A | Photosensitive composition | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6660450B2 | Resin useful for resist, resist composition and pattern forming process using the same | Emerging Cross-Sectional Technologies | 10 | Expired |
| US6541597B2 | Resin useful for resist, resist composition and pattern forming process using the same | Emerging Cross-Sectional Technologies | 10 | Expired |
| US7388725B2 | Magnetic recording media, method of manufacturing the same and magnetic recording apparatus | Physics | 9 | Expired |
| US6291129A | Monomer, high molecular compound and photosensitive composition | Emerging Cross-Sectional Technologies | 8 | Expired |
| US8361339B2 | Antireflection structure formation method and antireflection structure | Emerging Cross-Sectional Technologies | 5 | Active |
| US6410748B1 | Alicycli c group-containing monomer | Emerging Cross-Sectional Technologies | 5 | Expired |
| US7319568B2 | Magnetic recording media, magnetic recording apparatus, and stamper | Physics | 5 | Expired |
| US8840258B2 | Antireflection structure formation method and antireflection structure | Emerging Cross-Sectional Technologies | 4 | Active |
| US7738213B2 | Magnetic disk medium, reticle and magnetic recording and reproducing apparatus | Physics | 3 | Active |
| US9064522B2 | Stamper and method of manufacturing bit patterned medium using stamper | Performing Operations; Transporting | 2 | Active |
| US7119156B2 | Resist resin | Emerging Cross-Sectional Technologies | 1 | Expired |
| US7029823B2 | Resist composition | Emerging Cross-Sectional Technologies | 1 | Expired |
| US7817377B2 | Original disk fabrication method, magnetic recording medium manufacturing method and magnetic recording medium | Physics | 1 | Active |
| US7623311B2 | Recording media, recording and reproducing apparatus, and method for recording and reproducing | Physics | 1 | Active |
| US7070905B2 | Pattern forming process | Emerging Cross-Sectional Technologies | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.