Single wafer heat treatment apparatus
US5938850A · kind A · utility
29Cited by
3References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 30, 1996 |
| Grant date | Aug 17, 1999 |
| Priority date | — |
| Expiry date | Jul 30, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A single wafer heat treatment apparatus in which an object to be treated placed on a susceptor supported on a heat insulating member is heat-treated by indirectly heating the object to be treated by means of heating lamps disposed under the susceptor, characterized in that a gas entry preventive member for preventing process gas from being turned about the back surface of the susceptor is provided on a peripheral edge portion of the back surface of the susceptor. With this, process gas having entered the back surface of the susceptor is consumed by the adherence of a formed film to the surface of the gas entry preventive member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.