Drip catching apparatus for receiving excess photoresist developer solution
US5940651A · kind A · utility
8Cited by
3References
82Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 13, 1998 |
| Grant date | Aug 17, 1999 |
| Priority date | — |
| Expiry date | Feb 13, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A drip catching apparatus includes a trough 2 formed by a sidewall 26 and a drip catching surface 28 to prevent excess drops of a photoresist developer solution from dripping onto a semiconductor wafer 8 in a photoresist development cup 4. One or more holes 30 may be provided to drain the photoresist developer solution received by the drip trough 2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.