Christopher Lee Pike
18Patents
8h-index
10Co-inventors
58Inventor score
Filing activity: Feb 13, 1998 → May 21, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6420097B1 | Hardmask trim process | Electricity | 33 | Expired |
| US6257446A | Liquid chemical container with integrated fluid reservoir | Performing Operations; Transporting | 23 | Expired |
| US6496596B1 | Method for detecting and categorizing defects | Physics | 13 | Expired |
| US6411378B1 | Mask, structures, and method for calibration of patterned defect inspections | Physics | 12 | Expired |
| US6240874A | Integrated edge exposure and hot/cool plate for a wafer track system | Electricity | 12 | Expired |
| US6410927B1 | Semiconductor wafer alignment method using an identification scribe | Electricity | 11 | Expired |
| US6479879B1 | Low defect organic BARC coating in a semiconductor structure | Electricity | 9 | Expired |
| US5940651A | Drip catching apparatus for receiving excess photoresist developer solution | Physics | 8 | Expired |
| US6475905B1 | Optimization of organic bottom anti-reflective coating (BARC) thickness for dual damascene process | Electricity | 7 | Expired |
| US6100505A | Hotplate offset ring | Electricity | 6 | Expired |
| US6796517B1 | Apparatus for the application of developing solution to a semiconductor wafer | Performing Operations; Transporting | 5 | Expired |
| US6174632A | Wafer defect detection method utilizing wafer with development residue attracting area | Physics | 3 | Expired |
| US6281130A | Method for developing ultra-thin resist films | Emerging Cross-Sectional Technologies | 3 | Expired |
| US6642152B1 | Method for ultra thin resist linewidth reduction using implantation | Electricity | 1 | Expired |
| US6217936A | Semiconductor fabrication extended particle collection cup | Performing Operations; Transporting | 1 | Expired |
| US6326319A | Method for coating ultra-thin resist films | Electricity | 1 | Expired |
| US6288411A | Defect collecting structures for photolithography | Electricity | 0 | Expired |
| US6176274A | Method and system for measuring fluid volume in a photolithography track | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.