Self-cleaning focus ring
US5942039A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 1, 1997 |
| Grant date | Aug 24, 1999 |
| Priority date | — |
| Expiry date | May 1, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S156/916
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electrically activated focus ring (90) for plasma processing a substrate (25) in a plasma zone comprises a dielectric barrier (92) with a plasma focusing surface (95) for focusing the plasma onto the substrate surface, and an opposing surface (98). The focus ring (90) comprises an electrical conductor element (100) abutting at least a portion of the opposing surface (98) of the dielectric barrier (92). The conductor element (100) is electrically isolated from the plasma and capable of being electrically charged to attract the plasma to reduce formation of deposits on the plasma focusing surface (95) of the dielectric barrier (92).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.