Arnold Kholodenko
59Patents
27h-index
82Co-inventors
91Inventor score
Filing activity: Dec 2, 1992 → Jul 24, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6015465A | Temperature control system for semiconductor process chamber | Electricity | 630 | Expired |
| US6310755A | Electrostatic chuck having gas cavity and method | Chemistry; Metallurgy | 241 | Expired |
| US6095084A | High density plasma process chamber | Electricity | 140 | Expired |
| US6108189A | Electrostatic chuck having improved gas conduits | Emerging Cross-Sectional Technologies | 138 | Expired |
| US6828241B2 | Efficient cleaning by secondary in-situ activation of etch precursor from remote plasma source | Electricity | 131 | Expired |
| US6189484A | Plasma reactor having a helicon wave high density plasma source | Electricity | 77 | Expired |
| US6478924B1 | Plasma chamber support having dual electrodes | Emerging Cross-Sectional Technologies | 72 | Expired |
| US6471822B1 | Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma | Electricity | 67 | Expired |
| US6464790B1 | Substrate support member | Electricity | 67 | Expired |
| US6538872B1 | Electrostatic chuck having heater and method | Electricity | 66 | Expired |
| US6490146B2 | Electrostatic chuck bonded to base with a bond layer and method | Chemistry; Metallurgy | 58 | Expired |
| US6464795B1 | Substrate support member for a processing chamber | Electricity | 54 | Expired |
| US6320736A | Chuck having pressurized zones of heat transfer gas | Chemistry; Metallurgy | 53 | Expired |
| US5900064A | Plasma process chamber | Emerging Cross-Sectional Technologies | 53 | Expired |
| US6721162B2 | Electrostatic chuck having composite dielectric layer and method of manufacture | Emerging Cross-Sectional Technologies | 51 | Expired |
| US6033478A | Wafer support with improved temperature control | Emerging Cross-Sectional Technologies | 50 | Expired |
| US6094334A | Polymer chuck with heater and method of manufacture | Electricity | 49 | Expired |
| US6185839A | Semiconductor process chamber having improved gas distributor | Electricity | 39 | Expired |
| US6462928B1 | Electrostatic chuck having improved electrical connector and method | Electricity | 38 | Expired |
| US6151203A | Connectors for an electrostatic chuck and combination thereof | Electricity | 36 | Expired |
| US6908540B2 | Method and apparatus for encapsulation of an edge of a substrate during an electro-chemical deposition process | Chemistry; Metallurgy | 34 | Expired |
| US5942039A | Self-cleaning focus ring | Emerging Cross-Sectional Technologies | 32 | Expired |
| US6795292B2 | Apparatus for regulating temperature of a process kit in a semiconductor wafer-processing chamber | Electricity | 31 | Expired |
| US6503368B1 | Substrate support having bonded sections and method | Electricity | 30 | Expired |
| US6490145B1 | Substrate support pedestal | Electricity | 30 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.