Single-piece gas director for plasma reactors
US5942074A · kind A · utility
21Cited by
1References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 29, 1996 |
| Grant date | Aug 24, 1999 |
| Priority date | — |
| Expiry date | Mar 29, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Plasma etching apparatus for use in the manufacture of integrated circuit devices utilizes a one-piece director at an input of a process chamber that includes a sleeve portion and a bell jar portion. The director directs incoming process gas in the sleeve portion radially before the gas flows past electrodes used to establish a radio frequency discharge that ionizes the process gas. The one-piece director is clamped between the cap and the sleeve portion of the process chamber to eliminate the need for screws.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.