Patent · US Expired

Shelf-stable liquid metal arylketone alcoholate solutions and use thereof in photoinitiated patterning of thin films

US5942376A · kind A · utility

12Cited by
5References
16Claims
0Family size

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Key dates

Filing dateAug 14, 1997
Grant dateAug 24, 1999
Priority date
Expiry dateAug 14, 2017

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S505/734
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Solution films of a photosensitive metal arylketone alcoholate are micro-patterned by exposure to ultraviolet radiation under a mask. The resultant patterns are developed in an apolar solvent and annealed to provide thin film metal oxides for use in integrated circuits.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.