Shelf-stable liquid metal arylketone alcoholate solutions and use thereof in photoinitiated patterning of thin films
US5942376A · kind A · utility
12Cited by
5References
16Claims
0Family size
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Key dates
| Filing date | Aug 14, 1997 |
| Grant date | Aug 24, 1999 |
| Priority date | — |
| Expiry date | Aug 14, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/734
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Solution films of a photosensitive metal arylketone alcoholate are micro-patterned by exposure to ultraviolet radiation under a mask. The resultant patterns are developed in an apolar solvent and annealed to provide thin film metal oxides for use in integrated circuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.