Method of making a reusable photolithography mask
US5945238A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 6, 1998 |
| Grant date | Aug 31, 1999 |
| Priority date | — |
| Expiry date | Feb 6, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0035
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method is provided for making re-usable configuration masks by initially patterning a mask blank using precision mask-making tools. The mask is then covered with an opaque material, and desired configuration points for a particular ASIC are selected with a non-precision laser. After the particular configuration pattern is no longer needed, the remaining opaque material is removed. The mask can then be re-configured for a new design by covering the mask with a new layer of opaque material and selecting new configuration points. Such a mask reduces both time and costs for creating a set of mask designs because a single mask can be re-used for several different designs without the further need of precision mask-making tools.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.