Method of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposure
US5965895A · kind A · utility
5Cited by
21References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 4, 1997 |
| Grant date | Oct 12, 1999 |
| Priority date | — |
| Expiry date | Nov 4, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/1504
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for providing charged particle beam exposure onto an object having a plurality of chip areas with a plurality of aligning marks formed in correspondence to each of said chip areas. A charged particle beam is irradiated upon an object mounted on a mobile step based upon positions of the aligning marks. Actual positions of the alignment marks are detected and compared to the design positions of the alignment marks to determine approximate relationships which are used to calculate an actual position to perform exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.