Scanning exposure apparatus and method
US5969800A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 28, 1997 |
| Grant date | Oct 19, 1999 |
| Priority date | — |
| Expiry date | May 28, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A scanning exposure apparatus and method for synchronously moving a mask and a substrate with respect to an exposing radiation flux to project an image of a mask pattern on the mask onto the substrate, includes a movable mask stage for holding the mask, a movable substrate stage for holding the substrate, an alignment sensor detecting an initial rotational angle of the mask relative to the substrate, a projection optical system projecting the image of the mask pattern onto the substrate with a predetermined projection ratio, a mask position detector outputting first signals indicating the position of the mask stage, a substrate position detector outputting second signals indicating the position of the substrate stage, a calculation unit processing the first signals and the second signals in accordance with the projection ratio of the projection optical system and the initial rotational angle of the mask relative to the substrate to derive a positional deviation of the mask stage relative to the substrate stage, and a controller controlling the mask stage movement and the substrate stage movement to eliminate the positional deviation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.