Processing apparatus for target processing substrate
US5975097A · kind A · utility
19Cited by
10References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 26, 1997 |
| Grant date | Nov 2, 1999 |
| Priority date | — |
| Expiry date | Aug 26, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A processing apparatus of this invention has an openable window portion for transferring a target processing substrate, and an inlet port for introducing the outer atmosphere. Further, the processing apparatus includes a closed processing chamber for performing predetermined processing for the target processing substrate transferred via the window portion, an exhaust means for evacuating the interior of the processing chamber, and an opening/closing mechanism for closing the inlet port, and opening the inlet port when the pressure in the processing chamber is negative.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.