Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
US5976761A · kind A · utility
0Cited by
6References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 25, 1998 |
| Grant date | Nov 2, 1999 |
| Priority date | — |
| Expiry date | Mar 25, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0236
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin having low metal ions, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a resin a photoresist composition of superior quality containing such novolak resin, and a method for producing a semiconductor device using such photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.