Alkaline water-based solution for cleaning metallized microelectronic
US5980643A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 18, 1998 |
| Grant date | Nov 9, 1999 |
| Priority date | — |
| Expiry date | Jun 18, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/32134
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for use in the manufacture of a microelectronic device is set forth. The method include to a first step in which a workpiece including exposed aluminum metallized surfaces and residues is provided. The workpiece, including the exposed aluminum metallized surfaces, is then treated with an alkaline, water-based solution containing one or more components that form an aluminosilicate on the exposed aluminum metallized surfaces. The solution reacts with the residues and assists in removing them from the workpiece. Preferably, the solution is comprised of DI water, and ammonium hydroxide based component, such as TMAH, silicic acid, and aluminum hydroxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.