Michael Jolley
13Patents
8h-index
8Co-inventors
61Inventor score
Filing activity: Feb 21, 1995 → Mar 10, 2008
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7368927B2 | Probe head having a membrane suspended probe | Physics | 45 | Expired |
| US5489557A | Methods for processing semiconductors to reduce surface particles | Emerging Cross-Sectional Technologies | 43 | Expired |
| US6413436B1 | Selective treatment of the surface of a microelectronic workpiece | Emerging Cross-Sectional Technologies | 29 | Expired |
| US6632292B1 | Selective treatment of microelectronic workpiece surfaces | Emerging Cross-Sectional Technologies | 26 | Expired |
| US7399713B2 | Selective treatment of microelectric workpiece surfaces | Emerging Cross-Sectional Technologies | 18 | Expired |
| US7429537B2 | Methods and apparatus for rinsing and drying | Electricity | 10 | Expired |
| US7514944B2 | Probe head having a membrane suspended probe | Physics | 10 | Active |
| US5980643A | Alkaline water-based solution for cleaning metallized microelectronic | Electricity | 8 | Expired |
| US6217667A | Method for cleaning copper surfaces | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6632288B2 | Method for cleaning copper surfaces | Emerging Cross-Sectional Technologies | 1 | Expired |
| US6361611B1 | Solution for cleaning metallized microelectronic workpieces and methods of using same | Electricity | 1 | Expired |
| US6312527A | Non-corrosive cleaning method for use in the manufacture of microelectronic device | Electricity | 1 | Expired |
| US6394106B1 | Cleaning solutions and methods for semiconductor wafers | Chemistry; Metallurgy | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.