Stable, ionomeric photoresist emulsion and process of preparation and use thereof
US5981147A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 8, 1997 |
| Grant date | Nov 9, 1999 |
| Priority date | — |
| Expiry date | Apr 8, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0076
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are waterborne, stable photoresist compositions and methods of their preparation and use. The compositions are characterized by increased shear and storage stability. The photoresist composition comprises an aqueous emulsion of a 22% or less neutralized carboxylated resin and non-ionic surfactant containing poly(ethylene-oxide) segments, photopolymerizable monomer and photoinitiator. Neutralization is accomplished using either an organic or an inorganic base or mixtures thereof. The photoresist compositions are useful to selectively coat and protect surfaces subjected to corrosive environments, e.g., etchant processes, in the production of circuit traces for electronic circuit boards.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.