Apparatus and method for washing both surfaces of a substrate
US5985039A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 23, 1998 |
| Grant date | Nov 16, 1999 |
| Priority date | — |
| Expiry date | Feb 23, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus and method for scrubbing both surfaces of a substrate which includes a process section having a first unit, a second unit, a main arm mechanism for transferring a substrate into/from the first and second units, a first cassette or a second cassette section for transferring plural cassettes, a first and second sub-arm for transferring a substrate into/from the cassette sections, and controllers, such that a first substrate taken out from the first cassette section is subjected to the first unit and then subjected to the second unit, while a second substrate taken out from the second cassette is subjected to the second unit and then subjected to the first unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.