Patent · US Expired

Method for galvanic forming of bonding pads

US5989993A · kind A · utility

16Cited by
10References
14Claims
0Family size

Assignees

Inventors

Key dates

Filing dateApr 22, 1996
Grant dateNov 23, 1999
Priority date
Expiry dateApr 22, 2016

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/351
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Method for the preparation of electrodeposited or galvanically deposited bumps for the bonding of integrated circuits, characterized by two subsequent metal depositions, deposited without an external current source (chemical metal deposition) on a metallization 1, the first deposition being thicker than the second and the second deposition being more even or more regular throughout a large area than the first one.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.