Copper replenishment technique for precision copper plating system
US5997712A · kind A · utility
16Cited by
9References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 30, 1998 |
| Grant date | Dec 7, 1999 |
| Priority date | — |
| Expiry date | Mar 30, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D21/18
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A copper replenishment system for replenishing copper which is depleted from a copper plating solution. The replenishment is achieved by the use of a compact filter cartridge, which is inserted into a recirculating loop for the solution. The filter cartridge contains a chemical, which when reacting with the solution replenishes the copper into the solution. The filter cartridge is a compact unit which can be easily handled and reduces the amount of contaminants that could be introduced by the presence of the replenishment chemical.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.