Method of measuring interconnect coupling capacitance in an IC chip
US5999010A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 8, 1997 |
| Grant date | Dec 7, 1999 |
| Priority date | — |
| Expiry date | Dec 8, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R27/2605
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for measuring the coupling capacitance between two interconnect lines of an integrated circuit structure having a ground plane. The steps include shorting the first and second lines together and measuring a first capacitance (Ct) between the ground plane and the shorted first and second lines; eliminating the short between the first and second lines; shorting the first line to the ground plane and measuring a second capacitance (C1) between the second line and the shorted ground plane and first line; eliminating the short between the first line and the ground plane; shorting the second line to the ground plane and measuring a third capacitance (Cc) between the first line and the shorted ground plane and second line; and determining the coupling capacitance between the first line and the second line according to the formula Cc=(C1+C2-Ct)/2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.