Processing apparatus and a processing method
US6002572A · kind A · utility
8Cited by
16References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 24, 1998 |
| Grant date | Dec 14, 1999 |
| Priority date | — |
| Expiry date | Mar 24, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The processing apparatus prevents difficulty in separation of the substrate from the base because of charges on the substrate when the substrate is lifted from the base for substrate placing during processing. The processing apparatus comprises pins to lift up the substrate on the base and a neutralization apparatus to discharge ionized gas to the gap between the bottom of the substrate lifted from the base by the pins and the top of the base. When ionized gas is discharged to the substrate and the base, the charges are neutralized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.