Apparatus and method for measuring substrate temperature
US6007241A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 20, 1998 |
| Grant date | Dec 28, 1999 |
| Priority date | — |
| Expiry date | Feb 20, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J5/0003
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for measuring the temperature of a substrate in a thermal processing chamber. The substrate is suspended above a reflector to form a reflecting cavity. A probe of a temperature sensor has an input end positioned to receive radiation from the reflecting cavity and an output end optically coupled to a detector to provide a temperature reading. The temperature sensor is configured to reduce the effect that radiation which has an axis of propagation within an angle of an axis normal to the reflector, e.g., substantially normal radiation from a portion of the substrate adjacent to the input end of the probe, has on the temperature reading.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.