Aaron Muir Hunter
117Patents
15h-index
91Co-inventors
89Inventor score
Filing activity: Feb 20, 1998 → Nov 5, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6151446A | Apparatus and method for thermally processing substrates including a processor using multiple detection signals | Electricity | 390 | Expired |
| US6179466A | Method and apparatus for measuring substrate temperatures | Electricity | 49 | Expired |
| US8222574B2 | Temperature measurement and control of wafer support in thermal processing chamber | Electricity | 46 | Active |
| US7112763B2 | Method and apparatus for low temperature pyrometry useful for thermally processing silicon wafers | Electricity | 46 | Expired |
| US7279721B2 | Dual wavelength thermal flux laser anneal | Electricity | 32 | Expired |
| US6183130A | Apparatus for substrate temperature measurement using a reflecting cavity and detector | Physics | 32 | Expired |
| US6839507B2 | Black reflector plate | Electricity | 30 | Expired |
| US7127367B2 | Tailored temperature uniformity | Electricity | 22 | Expired |
| US7509035B2 | Lamp array for thermal processing exhibiting improved radial uniformity | Electricity | 22 | Expired |
| US6007241A | Apparatus and method for measuring substrate temperature | Physics | 20 | Expired |
| US7860379B2 | Temperature measurement and control of wafer support in thermal processing chamber | Electricity | 20 | Active |
| US7595208B2 | Method of laser annealing using two wavelengths of radiation | Electricity | 19 | Active |
| US6888104B1 | Thermally matched support ring for substrate processing chamber | Electricity | 18 | Expired |
| US6406179B2 | Sensor for measuring a substrate temperature | Physics | 17 | Expired |
| US6515261B1 | Enhanced lift pin | Chemistry; Metallurgy | 16 | Expired |
| US8111978B2 | Rapid thermal processing chamber with shower head | Electricity | 15 | Active |
| US8314371B2 | Rapid thermal processing chamber with micro-positioning system | Electricity | 14 | Active |
| US8254767B2 | Method and apparatus for extended temperature pyrometry | Electricity | 13 | Active |
| US7041931B2 | Stepped reflector plate | Electricity | 11 | Expired |
| US7398693B2 | Adaptive control method for rapid thermal processing of a substrate | Electricity | 11 | Active |
| US7414224B2 | Backside rapid thermal processing of patterned wafers | Mechanical Engineering; Lighting; Heating | 9 | Active |
| US8367983B2 | Apparatus including heating source reflective filter for pyrometry | Electricity | 9 | Active |
| US8900889B2 | Rapid thermal processing chamber with micro-positioning system | Electricity | 8 | Active |
| US7933009B2 | Method and apparatus for verifying proper substrate positioning | Electricity | 8 | Active |
| US8283607B2 | Apparatus including heating source reflective filter for pyrometry | Electricity | 8 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.