Interferometer system and lithograph apparatus including an interferometer system
US6020964A · kind A · utility
213Cited by
1References
40Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 13, 1998 |
| Grant date | Feb 1, 2000 |
| Priority date | — |
| Expiry date | Jul 13, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70775
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A composite interferometer system has a plurality of X and/or Y measuring axes which co-operate with an X and/or Y measuring mirror arranged on an object. The interferometer system also has at least one Z measuring axis, which extends partly in an XY plane and co-operates with Z measuring mirrors arranged on the object and Z reflectors. Thus, a larger number of more accurate and reliable measurements can be performed with the interferometer system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.