Installation to supply gas
US6030456A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Nov 13, 1998 |
| Grant date | Feb 29, 2000 |
| Priority date | — |
| Expiry date | Nov 13, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67253
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An installation can adjust gas supply in a reaction chamber according to the conditions in the reaction chamber. The installation comprises sensors, a gas-supplying panel and a driving device. The sensors are located in the reaction chamber to sense the conditions in the reaction chamber. The gas-supplying panel has a plurality of apertures, which are asymmetrically located, through which apertures gas is supplied. The driving device, coupled to the sensors and the gas-supplying panel, drives the gas-supplying panel to respond to the conditions sensed by the sensors, in which the gas-supplying panel can adjust the positions of the gas supplied through the apertures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.