Method and apparatus for preventing lightup of gas distribution holes
US6033585A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 20, 1996 |
| Grant date | Mar 7, 2000 |
| Priority date | — |
| Expiry date | Dec 20, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing chamber includes a substrate holder, a gas distribution member, and a shield for preventing lightup of plasma in gas distribution holes in the gas distribution member. The chamber can include an RF energy source such as an RF antenna which inductively couples RF energy through the gas distribution member to energize process gas into a plasma state. The shield can be arranged to allow capacitive coupling of RF energy into the processing chamber for lightup of plasma in the processing chamber and/or ion bombardment of the exposed surface of the gas distribution member for cleaning thereof during processing of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.