Thomas E. Wicker
24Patents
14h-index
14Co-inventors
74Inventor score
Filing activity: Dec 12, 1986 → Nov 5, 2003
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6583572B2 | Inductive plasma processor including current sensor for plasma excitation coil | Electricity | 420 | Expired |
| US5863376A | Temperature controlling method and apparatus for a plasma processing chamber | Electricity | 204 | Expired |
| US6164241A | Multiple coil antenna for inductively-coupled plasma generation systems | Electricity | 135 | Expired |
| US6129808A | Low contamination high density plasma etch chambers and methods for making the same | Emerging Cross-Sectional Technologies | 122 | Expired |
| US6463875B1 | Multiple coil antenna for inductively-coupled plasma generation systems | Electricity | 64 | Expired |
| US6227140A | Semiconductor processing equipment having radiant heated ceramic liner | Chemistry; Metallurgy | 58 | Expired |
| US4724510A | Electrostatic wafer clamp | Electricity | 56 | Expired |
| US5993594A | Particle controlling method and apparatus for a plasma processing chamber | Electricity | 54 | Expired |
| US6394026B1 | Low contamination high density plasma etch chambers and methods for making the same | Emerging Cross-Sectional Technologies | 50 | Expired |
| US6583064B2 | Low contamination high density plasma etch chambers and methods for making the same | Emerging Cross-Sectional Technologies | 48 | Expired |
| US6155199A | Parallel-antenna transformer-coupled plasma generation system | Electricity | 39 | Expired |
| US6464843B1 | Contamination controlling method and apparatus for a plasma processing chamber | Electricity | 34 | Expired |
| US7096819B2 | Inductive plasma processor having coil with plural windings and method of controlling plasma density | Electricity | 34 | Expired |
| US6033585A | Method and apparatus for preventing lightup of gas distribution holes | Electricity | 14 | Expired |
| US6035868A | Method and apparatus for control of deposit build-up on an inner surface of a plasma processing chamber | Emerging Cross-Sectional Technologies | 13 | Expired |
| US6251793A | Particle controlling method for a plasma processing chamber | Electricity | 12 | Expired |
| US6306244A | Apparatus for reducing polymer deposition on substrate support | Emerging Cross-Sectional Technologies | 12 | Expired |
| US5518547A | Method and apparatus for reducing particulates in a plasma tool through steady state flows | Chemistry; Metallurgy | 11 | Expired |
| US6673198B1 | Semiconductor processing equipment having improved process drift control | Electricity | 10 | Expired |
| US6028286A | Method for igniting a plasma inside a plasma processing reactor | Electricity | 10 | Expired |
| US5543184A | Method of reducing particulates in a plasma tool through steady state flows | Chemistry; Metallurgy | 8 | Expired |
| US6155203A | Apparatus for control of deposit build-up on an inner surface of a plasma processing chamber | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6881608B2 | Semiconductor processing equipment having improved process drift control | Electricity | 5 | Expired |
| US6527912B2 | Stacked RF excitation coil for inductive plasma processor | Electricity | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.