Reflector cover for a semiconductor processing chamber
US6035100A · kind A · utility
14Cited by
6References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 16, 1997 |
| Grant date | Mar 7, 2000 |
| Priority date | — |
| Expiry date | May 16, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J5/0003
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In one embodiment, the invention is directed to an apparatus for preventing depositions from occurring on a reflector in a processing chamber, comprising: a cover disposed adjacent to the reflector, the cover optically transparent over a range of wavelengths in which the reflector is reflective; and at least one cover support for maintaining the position of the cover relative to the reflector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.