Automatic recipe adjust and download based on process control window
US6041270A · kind A · utility
60Cited by
5References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 5, 1997 |
| Grant date | Mar 21, 2000 |
| Priority date | — |
| Expiry date | Dec 5, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/20
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of manufacturing semiconductor wafers using a simulation tool to determine a set of predicted wafer electrical test measurements that are compared to a set of target wafer electrical test measurements to obtain a set of optimized process parameters for the equipment for the next process. The optimized process parameters are compared to the equipment characteristics for the equipment of the next process and the process parameters for the next process are automatically adjusted.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.