Method of cleaning CVD cold-wall chamber and exhaust lines
US6042654A · kind A · utility
66Cited by
10References
39Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 13, 1998 |
| Grant date | Mar 28, 2000 |
| Priority date | — |
| Expiry date | Jan 13, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4405
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of cleaning post deposition deposits from a processing chamber by providing a chlorine gas (Cl.sub.2), forming chlorine radicals and reacting the chlorine radicals with the deposits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.