E-beam application to mask making using new improved KRS resist system
US6043003A · kind A · utility
23Cited by
13References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 16, 1999 |
| Grant date | Mar 28, 2000 |
| Priority date | — |
| Expiry date | Jul 16, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to chemically amplified resists and resist systems wherein some of the polar functional groups of the aqueous base soluble polymer or copolymers are protected with a cyclic aliphatic ketal protecting group such as methoxycyclohexanyl. The resists and the resist systems of the present invention containing the new protecting group have improved shelf-life and vacuum stability as compared to the prior art resists. Thus, the resists of the present invention are highly useful in e-beam lithographic applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.