Photosensitive composition
US6045968A · kind A · utility
12Cited by
13References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 17, 1998 |
| Grant date | Apr 4, 2000 |
| Priority date | — |
| Expiry date | Jun 17, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive composition contains an acid-decomposable resin, a photo-acid-generating agent, and a naphthol novolak compound with a molecular weight of 2000 or less. The acid-decomposable resin is preferably a copolymer consisting of a polymerizable compound having an alicyclic skeleton as a monomer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.