Guard cell for etching
US6060398A · kind A · utility
9Cited by
5References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 9, 1998 |
| Grant date | May 9, 2000 |
| Priority date | — |
| Expiry date | Mar 9, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for protecting a neighboring area that is adjacent to a first area that is to be etched. The method includes creating a guard cell substantially surrounding the first area, but excluding the neighboring area. The guard cell is formed of a material that is substantially selective to the etch process subsequently employed to etch within the first area. After the guard cell is formed, an etch is performed within the first area, while the guard cell prevents etching of the neighboring are outside the guard cell.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.