Patent · US Expired

Substrate support apparatus and method for fabricating same

US6067222A · kind A · utility

17Cited by
1References
24Claims
0Family size

Assignee

Inventor

Key dates

Filing dateNov 25, 1998
Grant dateMay 23, 2000
Priority date
Expiry dateNov 25, 2018

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T279/23
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An apparatus for retaining a substrate and method of fabricating same. Specifically, a Johnsen-Rahbek effect electrostatic chuck comprising a chuck body, at least one electrode disposed within said chuck body and a barrier formed around said at least one electrode. The barrier is fabricated of a material selected from the group consisting of conductive materials and semiconductive materials and in one instance is an alloy of a material of which the electrode is fabricated. Alternately, the barrier is formed of a dielectric material that is not the same material of which the chuck body is fabricated. The resultant apparatus provides an electrostatic chuck that has a reduced charge accumulation effect at the electrode/chuck body interface. Reducing charge accumulation maintains the desired electrostatic chucking forces in such a device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.