Cleaning and drying apparatus, wafer processing system and wafer processing method
US6068002A · kind A · utility
25Cited by
10References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 24, 1998 |
| Grant date | May 30, 2000 |
| Priority date | — |
| Expiry date | Mar 24, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A drying unit is disposed above a cleaning tank containing a cleaning liquid for cleaning semiconductor wafers W. A wafer boat holding semiconductor wafers moves between the cleaning tank and the drying unit. The drying unit has a fixed base surrounding an opening formed in the cleaning tank, a liftable top cover placed on the fixed base, and an O-ring interposed between the fixed base and the liftable top cover. The liftable top cover can be moved vertically by a first lifting means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.