Gas mixing apparatus and method
US6068703A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 11, 1997 |
| Grant date | May 30, 2000 |
| Priority date | — |
| Expiry date | Jul 11, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01F23/10
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention provides apparatus, systems, and methods related to the manufacture of integrated circuits. Specifically, embodiments of the present invention include apparatus designed to provide thorough and reliable fluid mixture for gases used in a semiconductor processing system. In one embodiment of the invention, the gas mixing apparatus comprises a gas mixer housing having a gas inlet, a fluid flow channel, and a gas outlet. The fluid flow channel is fluidly coupled to a plurality of gas sources. The majority of the gas mixture occurs in the fluid flow channel which comprises one or more fluid separators for separating the gas into two or more gas portions and one or more fluid collectors for allowing the gas portions to collide with each other to mix the gas portions. This separation and collection of the gas portions results in a thoroughly mixed gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.