Transparent resin, photosensitive composition, and method of forming a pattern
US6071670A · kind A · utility
18Cited by
5References
43Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 10, 1997 |
| Grant date | Jun 6, 2000 |
| Priority date | — |
| Expiry date | Oct 10, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/109
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive composition comprising, an oligomer having a backbone chain comprising an alicyclic skeleton and/or a conjugated polycondensed aromatic skeleton, the backbone chain being acid-decomposable or hydrolyzable, and a photo-acid-generating agent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.