Rotating anode for a wafer processing chamber
US6077412A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 30, 1998 |
| Grant date | Jun 20, 2000 |
| Priority date | — |
| Expiry date | Oct 30, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D21/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A processing chamber for depositing and/or removing material onto/from a semiconductor wafer when the wafer is subjected to an electrolyte and in an electric field, and in which a rotating anode is used to agitate and distribute the electrolyte. A hollow sleeve is utilized to form a containment chamber for holding the electrolyte. A wafer residing on a support is moved vertically upward to engage the sleeve to form an enclosing floor for the containment chamber. One electrode is disposed within the containment chamber while the opposite electrode is comprised of several electrodes distributed around the circumference of the wafer. The electrodes are also protected from the electrolyte when the support is raised and engaged to the sleeve. In one embodiment, the support and the sleeve are stationary during processing, while a rotating anode is used to agitate and distribute the electrolyte. With a stationary sleeve, fluid feed and evacuation lines can be coupled through the sleeve to access the containment chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.