Compact microwave downstream plasma system
US6080270A · kind A · utility
27Cited by
3References
60Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 14, 1997 |
| Grant date | Jun 27, 2000 |
| Priority date | — |
| Expiry date | Jul 14, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B6/806
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A compact microwave downstream plasma system includes, within a significantly small portable housing unit, a power supply, a microwave generator, a non-linear waveguide, a circulator, a dummy load, a plasma applicator, and an igniter. The microwave generator supplies microwaves to the guide to the applicator. The guide includes several curved regions that allow for a more compact design. The applicator is configured to generate a plasma and output reactants that can be used to remove photoresist layers from a wafer within a process reactor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.